vapour deposition

Investigation and application of microwave electron cyclotron resonance plasma physical vapour deposition

微波ECR等离子体物理汽相沉积研究和应用

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Update the processing methods to make SOFC from solid electrolytical film are by chemical vapour deposition, electrophoretic deposition, flow stretching, sputtering, plasma sputter coating, etc.

目前，SOFC用固体电解质薄膜制备方法有电化学气相沉积法、化学气相沉积法、电泳沉积法、溅射法、等离子喷涂法等。

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Iron oxide-mica pearlescent pigment was prepared from Fe ( CO) 5 in a spout fluidized reactor using metal organic chemistry vapour deposition ( MOCVD) technique.

以Fe（CO）5为物源，在常压喷动流化反应器中，以金属有机化学气相沉积（MOCVD）法对云母粉进行包覆，制备铁系-云母珠光颜料。

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The vapour generator for chemical vapour deposition plants allows the extraction of vapours.

用于化学汽相沉积器的蒸汽发生器允许蒸汽抽提.

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The continuous SiC fibers coated with B 4 C using chemical vapour deposition ( CVD ) were made.

采用化学气相沉积 ( CVD ) 方法,在连续SiC纤维 表面沉积一层B4C涂层.

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Sulfur incorporation in diamond was performed by B-S co-doping method via microwave plasma chemical vapour deposition ( MPCVD) technique on undoped Si as substrates. Dimethyl disulfide and boron oxide were the doping sources, which were diluted in acetone.

利用微波等离子体化学气相沉积（MPCVD）技术，以丙酮为碳源，用二甲基二硫和三氧化二硼作掺杂源，在硅衬底上制备了硼与硫共掺杂的金刚石薄膜。

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High quality amorphous silicon films fabrication by hot wire chemical vapour deposition technique

用热丝法制备优质稳定非晶硅薄膜的研究

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Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper.

本文评述了化学气相沉积法制备人造金刚石薄膜的进展情况.

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Using chemical vapour deposition ( CVD) method to decompose alcohol at high-temperature with ze-olite ( synthetic satonite)-based Fe particles as catalyst, aut hors synthesize carbon nanotubes ( CNTs) of thinner walls and opened ends.

利用CVD法高温分解无水乙醇，以分子筛（合成皂石）基体上的Fe颗粒为催化剂，制备出了管壁更薄、端部为开口结构的碳纳米管。

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The present article introduces a new technique of chemical vapour deposition titanium Carbide.

本文介绍了一种新的化学气相沉积碳化钛方法。

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The structure and the acidic properties of H β zeolite were modified with phosphorus pentoxide added by using chemical vapour deposition method.

采用化学气相沉积法，研究了五氧化二磷对Hβ分子筛酸性和孔结构的改性。

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Thermally activated chemical vapour deposition

化学需氧量（沉淀）热活化化学气相沉积

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The diamond films were deposited in a quartz bell jar type microwave plasma chemical vapour deposition ( MW& PCVD) research device.

利用石英钟罩式微波等离子体化学气相沉积（MW－PCVD）实验装置研究了不同沉积气压对金刚石薄膜沉积结果的影响。

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For the high technical maturity and the high deposition quality, traditional plasma enhanced chemical vapour deposition ( PECVD) technology was wide applied in the large-scale industrial production.

传统等离子体增强化学气相沉积（PECVD）技术，工艺成熟，制备的薄膜质量高，较适合大规模工业化生产。

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